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SiC thermal field by PVT method

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Product Description

 Isostatic Graphite-Optical Fiber, Semiconductor
The company develops graphite parts dedicated to optical fiber and semiconductor fields, which are suitable for a variety of scenarios.
  First Generation Semiconductor(silicon wafer pulling, epitaxy, SOI): heater, crucible, insulation barrel, diversion barrel and other thermal field components
  Third-generation semiconductors(Production of SiC Single Crystal and GaN Substrate Epitaxy by PVT Method): Crucible, Insulating and Heating Graphite Parts, Breathable Plate, Graphite for Substrate Epitaxy, Porous Graphite
  Fiber:Heater, insulation tube, muffer tube and other graphite devices
  Others:Chip Packaging, Ion Injection and Etching, Bubble Sapphire

Specification and technical index of isostatic graphite for optical fiber and semiconductor

Indicators Unit GRB1 GRB2 GRB3
Bulk density g/cm³ 1.78-1.80 1.80-1.82 1.82-1.85
flexural strength Mpa 45.00 50.00 55.00
Shore hardness HS 55.00 65.00 68.00
Resistivity Mm 11-13 11-13 11-13
Coefficient of thermal expansion 10-6/℃ 4.50 4.70 4.80
porosity % 12.00 10.00 8.00
average particle size μm 12 10 10

 Note:1) The thermal expansion coefficient sample is 10*50mm, and the temperature is RT-600 ℃
2) product indicators and specifications can be customized according to customer requirements
3) Total ash <5ppm, trace element content can meet semiconductor requirements
  The company has also developed porous graphite, air floating graphite, continuous casting graphite, electric spark graphite and other graphite materials, can provide customized products and services according to customer needs, welcome to discuss exchanges!

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